Catherall, David

Article from CaltechAUTHORS

• Hossain, Azmain A. and Murphy, Sela, el al. (2025) Atomic layer etching of niobium nitride using sequential exposures of O₂ and H₂/SF₆ plasmas; Journal of Vacuum Science & Technology A; Vol. 43; No. 4; 10.1116/6.0004548